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More Insight into Ionization and Sputtering Systems

September 30, 2013 by · Leave a Comment 

What divides magnetron sputtering from various other sputtering approaches is the very high level of ionization of the target material which is deposited on the substrate. The film deposited can be as thin as a few atoms, but it’s nearly as strong as a diamond.

A magnetron sputtering system, likewise called high-power impulse magnetron sputtering (HiPIMS) and high-power pulsed magnetron sputtering (HPPMS), is a fairly new advancement in precision vacuum system processes. The first device was made by Kouznetsov in October of 2001. Most industries that create medical tools, optical instruments and semi-conductors have benefited from this technology

If a product to be coated requires many layers of coating, it may require a greater ionization, a requirement a magnetron sputtering system could do. The magnetron cathode uses electromagnetic fields to contain the atoms and molecules, creating a highly concentrated beam that bombards the intended material.

Magnetron sputtering systems also provide the benefit of offering more choices than traditional, non-magnetron techniques. Magnetron sputtering systems can deposit denser, harder films. Objects that need to be protected from abrasion, heat and pressure can benefit from ionization in the sputtering process. The magnetron sputtering process offers a superior result for efforts to coat sensitive instruments and devices.

Guest post is provided by Denton Vacuum, LLC, offering the magnetron sputtering system and more. Visit the website for more details at www.dentonvacuum.com.

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